We are a technology transfer company focused on
design and synthesis of nanophases and their insertion into
electronic, photovoltaic, and medical implant manufacturing.
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We modify silicon-based surfaces such as silicon, silicon oxides, and PDMS-silicone in the nano-scale using polymer adsorption to control water condensation behavior via surface free energy and topography alterations.
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We modify nano-structures of the polymer surfaces such as PC-polycarbonate, PMMA-acrylic, and PDMS-silicone via surface patterning/imprinting.
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We design and synthesize below 480K (200oC) new "designer interphases" for silicon/silicate devices, which we call NanoOxides™. We design NanoOxides™ with unique mechanical, electronic and/or photovoltaic properties, building on our recent success in creating commensurate and discommensurate silica interfacial phases on OH-terminated (1x1)Si(100) at RT via our patented chemical processing in ambient.
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Precursor phases nucleated by chemical and thermal processing at temperature below 480 K inside our Class 10 clean-room, are used as templates for synthesizing NanoOxides.
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Applications reside in four areas (1) medical implants (2) high longevity/performance photovoltaics encapsulation (3) high-k dielectrics for C-MOS gates (4) NanoBonding™ where two silicon-based substrates, such as quartz, Si, or borosilicate pairs are bonded hermetically at the molecular level.